來源: 華匯儀器 作者: D. Hosner 時(shí)間: 2016-11-02 點(diǎn)擊:
1612 次
Liu, Y.M., Jiang, C.L., Pei, Z.L., Lei, H., Gong, J., Sun, C., Microstructure and properties of AlB2-type WB2 thin films deposited by direct-current magnetron sputtering. Surface & Coatings Technology (245), 2014, 108–116.